Structure and growth of titanium buffer layers on Al 2 O 3 (0 0 0 1)
نویسندگان
چکیده
منابع مشابه
Shallow implantation of Ti ions in sapphire [ a - Al 2 O 3 ( 0 0 0 1 ) ]
Sapphire single crystal [a-Al2O3(0 0 0 1)] samples were treated by irradiation with Ti ions in the energy range 0.5±7.0 keV at 25°C and 750°C under UHV conditions for total doses of 10 Ti/cm2. These Ti treated sapphire samples were studied by ex situ X-ray photoelectron spectroscopy (XPS) depth pro®ling and by atomic force microscopy (AFM). Aluminum in the oxidation states Al0;3;x, where 0 ...
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0039-6028/$ see front matter 2009 Elsevier B.V. A doi:10.1016/j.susc.2009.06.006 * Corresponding author. Address: Department of neering, Northwestern University, 2220 N Campus Dr E-mail address: [email protected] (L.D. M The so-called Biphase termination on a-Fe2O3 has been widely accepted to be a structure with a 40 Å unit supercell composed of coexisting islands of Fe1 xO and a-Fe2O3. ...
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ژورنال
عنوان ژورنال: Surface Science
سال: 2004
ISSN: 0039-6028
DOI: 10.1016/j.susc.2004.03.072